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pubmed-article:19567960rdf:typepubmed:Citationlld:pubmed
pubmed-article:19567960lifeskim:mentionsumls-concept:C0425245lld:lifeskim
pubmed-article:19567960lifeskim:mentionsumls-concept:C1721063lld:lifeskim
pubmed-article:19567960lifeskim:mentionsumls-concept:C1708057lld:lifeskim
pubmed-article:19567960pubmed:issue29lld:pubmed
pubmed-article:19567960pubmed:dateCreated2009-7-1lld:pubmed
pubmed-article:19567960pubmed:abstractTextWe present numerical simulations of gate-all-around (GAA) 3C-SiC and Si nanowire (NW) field effect transistors (FETs) using a full quantum self-consistent Poisson-Schrödinger algorithm within the non-equilibrium Green's function (NEGF) formalism. A direct comparison between Si and 3C-SiC device performances sheds some light on the different transport properties of the two materials. Effective mobility extraction has been performed in a linear transport regime and both phonon- (PH) and surface-roughness-(SR) limited mobility values were computed. 3C-SiC FETs present stronger acoustic phonon scattering, due to a larger deformation potential, resulting in lower phonon-limited mobility values. Although Si NW devices reveal a slightly better electrostatic control compared to 3C-SiC ones, SR-limited mobility shows a slower degradation with increasing charge density for 3C-SiC devices. This implies that the difference between Si and 3C-SiC device mobility is reduced at large gate voltages. 3C-SiC nanowires, besides their advantages compared to silicon ones, present electrical transport properties that are comparable to the Si case.lld:pubmed
pubmed-article:19567960pubmed:languageenglld:pubmed
pubmed-article:19567960pubmed:journalhttp://linkedlifedata.com/r...lld:pubmed
pubmed-article:19567960pubmed:statusPubMed-not-MEDLINElld:pubmed
pubmed-article:19567960pubmed:monthJullld:pubmed
pubmed-article:19567960pubmed:issn1361-6528lld:pubmed
pubmed-article:19567960pubmed:authorpubmed-author:PollPPlld:pubmed
pubmed-article:19567960pubmed:authorpubmed-author:BanuCClld:pubmed
pubmed-article:19567960pubmed:authorpubmed-author:PalaM GMGlld:pubmed
pubmed-article:19567960pubmed:authorpubmed-author:RogdakisKKlld:pubmed
pubmed-article:19567960pubmed:authorpubmed-author:ZekentesKKlld:pubmed
pubmed-article:19567960pubmed:issnTypeElectroniclld:pubmed
pubmed-article:19567960pubmed:day22lld:pubmed
pubmed-article:19567960pubmed:volume20lld:pubmed
pubmed-article:19567960pubmed:ownerNLMlld:pubmed
pubmed-article:19567960pubmed:authorsCompleteYlld:pubmed
pubmed-article:19567960pubmed:pagination295202lld:pubmed
pubmed-article:19567960pubmed:year2009lld:pubmed
pubmed-article:19567960pubmed:articleTitlePhonon- and surface-roughness-limited mobility of gate-all-around 3C-SiC and Si nanowire FETs.lld:pubmed
pubmed-article:19567960pubmed:affiliationIMEP-LAHC/INP Grenoble, MINATEC, 3 parvis Louis Néel, BP 257, F-38016 Grenoble, France. rogdakik@minatec.inpg.frlld:pubmed
pubmed-article:19567960pubmed:publicationTypeJournal Articlelld:pubmed
pubmed-article:19567960pubmed:publicationTypeResearch Support, Non-U.S. Gov'tlld:pubmed