Statements in which the resource exists as a subject.
PredicateObject
rdf:type
lifeskim:mentions
pubmed:issue
6
pubmed:dateCreated
2009-6-10
pubmed:abstractText
We developed a hybrid nanoimprint-soft lithography technique with sub-15 nm resolution. It is capable of patterning both flat and curved substrates. The key component of the technology is the mold, which consists of rigid features on an elastic poly(dimethylsiloxane) (PDMS) support. The mold was fabricated by imprinting a reverse image onto the PDMS substrate using a UV-curable low-viscosity prepolymer film. Patterns with sub-15-nm resolution were faithfully duplicated on a flat substrate without applying external pressure. Gratings at 200 nm pitch were also successfully imprinted onto the cylindrical surface of a single mode optical fiber with a 125 microm diameter.
pubmed:language
eng
pubmed:journal
pubmed:status
PubMed-not-MEDLINE
pubmed:month
Jun
pubmed:issn
1530-6992
pubmed:author
pubmed:issnType
Electronic
pubmed:volume
9
pubmed:owner
NLM
pubmed:authorsComplete
Y
pubmed:pagination
2306-10
pubmed:year
2009
pubmed:articleTitle
Hybrid nanoimprint-soft lithography with sub-15 nm resolution.
pubmed:affiliation
Department of Materials Science and Engineering, National Laboratory of Solid State Microstructure, Nanjing University, Nanjing 210093, People's Republic of China.
pubmed:publicationType
Journal Article, Research Support, Non-U.S. Gov't