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pubmed-article:16893605rdf:typepubmed:Citationlld:pubmed
pubmed-article:16893605lifeskim:mentionsumls-concept:C0302523lld:lifeskim
pubmed-article:16893605lifeskim:mentionsumls-concept:C0700325lld:lifeskim
pubmed-article:16893605lifeskim:mentionsumls-concept:C0596539lld:lifeskim
pubmed-article:16893605lifeskim:mentionsumls-concept:C1521738lld:lifeskim
pubmed-article:16893605pubmed:issue2-3lld:pubmed
pubmed-article:16893605pubmed:dateCreated2006-12-25lld:pubmed
pubmed-article:16893605pubmed:abstractTextField evaporation studies of crystalline <100> Si were performed in a three-dimensional atom-probe, which utilized a local electrode geometry. Several distinct phenomena were observed. Si field evaporation rates showed: (1) no measurable dependence on temperature below 110K, (2) an exponential dependence on evaporation rate as a function of temperature above 110K, and (3) no dependence on substrate doping (i.e., electrical conductivity) as high as 10 Omega cm in the temperature range of 40-150K. Two distinct evaporation modes were observed. The first was associated with approximately 1at% H+ in the mass spectrum. Negligible amounts of H were detected in the mass spectra of the second mode. When the pulse fraction (pf) was increased from 5% to 30%, the presence of H+ in the mass spectra, i.e. operation in the first mode, was associated with a degradation in mass resolution by as much as 80% for the 10 Omega cm Si samples. Conversely, no loss in mass resolution was detected for the approximately 0.001 Omega cm samples over the pf range studied.lld:pubmed
pubmed-article:16893605pubmed:languageenglld:pubmed
pubmed-article:16893605pubmed:journalhttp://linkedlifedata.com/r...lld:pubmed
pubmed-article:16893605pubmed:statusPubMed-not-MEDLINElld:pubmed
pubmed-article:16893605pubmed:issn0304-3991lld:pubmed
pubmed-article:16893605pubmed:authorpubmed-author:ThompsonKeith...lld:pubmed
pubmed-article:16893605pubmed:authorpubmed-author:SebastianJaso...lld:pubmed
pubmed-article:16893605pubmed:authorpubmed-author:GerstlStephan...lld:pubmed
pubmed-article:16893605pubmed:issnTypePrintlld:pubmed
pubmed-article:16893605pubmed:volume107lld:pubmed
pubmed-article:16893605pubmed:ownerNLMlld:pubmed
pubmed-article:16893605pubmed:authorsCompleteYlld:pubmed
pubmed-article:16893605pubmed:pagination124-30lld:pubmed
pubmed-article:16893605pubmed:articleTitleObservations of Si field evaporation.lld:pubmed
pubmed-article:16893605pubmed:affiliationImago Scientific Instruments, Inc. 6300 Enterprise Lane Suite 100, Madison, WI 53711, USA. kthompson@imago.comlld:pubmed
pubmed-article:16893605pubmed:publicationTypeJournal Articlelld:pubmed