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rdf:type
lifeskim:mentions
pubmed:issue
7
pubmed:dateCreated
2006-7-20
pubmed:abstractText
This paper describes a rational approach for reproducibly patterning single Au nanoparticles, 15-20-nm diameter, on silicon wafer substrates. The approach uses scanning probe oxidation (SPO) to pattern silicon oxide nanodomain arrays on silicon substrates modified with octadecyltrimethoxysilane (OTS). It was usually found using aminopropyltrimethoxysilane (APS) that Au nanoparticles only assembled at the domain boundaries probably because of asymmetrically distributed hydroxyl groups. To generate uniformly distributed hydroxyl groups on oxide domains, we employed a two-step treatment to etch and oxidize the substrate. With this treatment, oxide domains consistently attached Au nanoparticles to maximum capacity. Single Au nanoparticles were readily patterned by fabricating oxide nanodomains with a diameter below 30 nm. We also investigated the deposition of APS on OTS monolayers, which resulted in the assembly of Au nanoparticles outside of the oxide domains, and proposed two alternative methods to inhibit it.
pubmed:language
eng
pubmed:journal
pubmed:status
PubMed-not-MEDLINE
pubmed:month
Feb
pubmed:issn
1520-6106
pubmed:author
pubmed:issnType
Print
pubmed:day
24
pubmed:volume
109
pubmed:owner
NLM
pubmed:authorsComplete
Y
pubmed:pagination
2657-65
pubmed:year
2005
pubmed:articleTitle
Reproducible patterning of single au nanoparticles on silicon substrates by scanning probe oxidation and self-assembly.
pubmed:affiliation
College of Chemistry and Molecular Engineering, Center for Nanoscale Science and Technology (CNST), Peking University, Beijing 100871, China.
pubmed:publicationType
Journal Article