Statements in which the resource exists as a subject.
PredicateObject
rdf:type
lifeskim:mentions
pubmed:issue
4
pubmed:dateCreated
2003-5-5
pubmed:abstractText
To understand the electrical properties at passivated metal-semiconductor interfaces, two types of mercury-insulator-silicon (n-type) junctions, Hg\C10H21-Si and Hg\SiO2-Si, were fabricated and their current-voltage and capacitance-voltage characteristics compared. Both of them exhibited near-ideal rectifying characteristics with an excellent saturation current at reverse bias, which is in contrast to the previously reported ohmic behavior of an unmodified mercury-silicon junction. The experimental results also indicated that the n-decyl monolayer passivated junction possesses a higher effective barrier height, a lower ideality factor (that is, closer to unity), and better reproducibility than that of native silicon oxide. In addition, the dopant density and build-in potential, extracted from capacitance-voltage measurements of these passivated mercury-silicon junctions, revealed that alkyl monolayer derivatization does not alter the intrinsic properties of the silicon substrate. The calculated surface state density at the alkyl monolayer\silicon interface is lower than that of the silicon oxide\silicon interface. The present study increases the possibility of using advanced organic materials as ultrathin insulator layers for miniaturized, silicon-based microelectronic devices.
pubmed:language
eng
pubmed:journal
pubmed:status
PubMed-not-MEDLINE
pubmed:month
Apr
pubmed:issn
1439-4235
pubmed:author
pubmed:issnType
Print
pubmed:day
14
pubmed:volume
4
pubmed:owner
NLM
pubmed:authorsComplete
Y
pubmed:pagination
335-42
pubmed:dateRevised
2003-11-4
pubmed:year
2003
pubmed:articleTitle
Alkyl monolayer passivated metal-semiconductor diodes: 2: Comparison with native silicon oxide.
pubmed:affiliation
Department of Chemistry, Simon Fraser University, 8888 University Drive, Burnaby, British Columbia V5A 1S6, Canada.
pubmed:publicationType
Journal Article