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rdf:type |
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lifeskim:mentions |
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pubmed:issue |
19
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pubmed:dateCreated |
2011-3-25
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pubmed:abstractText |
The thermal decomposition of ultrathin HfO(2) films (?0.6-1.2 nm) on Si by ultrahigh vacuum annealing (25-800?°C) is investigated in situ in real time by scanning tunneling microscopy. Two distinct thickness-dependent decomposition behaviors are observed. When the HfO(2) thickness is ? 0.6 nm, no discernible morphological changes are found below ? 700?°C. Then an abrupt reaction occurs at 750?°C with crystalline hafnium silicide nanostructures formed instantaneously. However, when the thickness is about 1.2 nm, the decomposition proceeds gradually with the creation and growth of two-dimensional voids at 800?°C. The observed thickness-dependent behavior is closely related to the SiO desorption, which is believed to be the rate-limiting step of the decomposition process.
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pubmed:language |
eng
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pubmed:journal |
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pubmed:citationSubset |
IM
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pubmed:chemical |
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pubmed:status |
MEDLINE
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pubmed:month |
May
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pubmed:issn |
1361-6528
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pubmed:author |
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pubmed:issnType |
Electronic
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pubmed:day |
13
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pubmed:volume |
22
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pubmed:owner |
NLM
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pubmed:authorsComplete |
Y
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pubmed:pagination |
195705
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pubmed:meshHeading |
pubmed-meshheading:21430314-Crystallization,
pubmed-meshheading:21430314-Hafnium,
pubmed-meshheading:21430314-Hot Temperature,
pubmed-meshheading:21430314-Humans,
pubmed-meshheading:21430314-Materials Testing,
pubmed-meshheading:21430314-Microscopy, Electron, Transmission,
pubmed-meshheading:21430314-Microscopy, Scanning Tunneling,
pubmed-meshheading:21430314-Nanostructures,
pubmed-meshheading:21430314-Oxides,
pubmed-meshheading:21430314-Silicates,
pubmed-meshheading:21430314-Silicon,
pubmed-meshheading:21430314-Silicon Dioxide,
pubmed-meshheading:21430314-Temperature,
pubmed-meshheading:21430314-Time Factors
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pubmed:year |
2011
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pubmed:articleTitle |
Probing the thermal decomposition behaviors of ultrathin HfO2 films by an in situ high temperature scanning tunneling microscope.
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pubmed:affiliation |
Department of Electronic Engineering, The Chinese University of Hong Kong, Shatin, NT, Hong Kong, SAR. k.xue@unsw.edu.au
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pubmed:publicationType |
Journal Article,
Research Support, Non-U.S. Gov't
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