Source:http://linkedlifedata.com/resource/pubmed/id/19257375
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rdf:type | |
lifeskim:mentions | |
pubmed:issue |
3
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pubmed:dateCreated |
2009-3-4
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pubmed:abstractText |
We report on spin injection experiments at a Co/Al2O3/GaAs interface with electrical detection. The application of a transverse magnetic field induces a large voltage drop DeltaV at the interface as high as 1.2 mV for a current density of 0.34 nA.microm(-2). This represents a dramatic increase of the spin accumulation signal, well above the theoretical predictions for spin injection through a ferromagnet/semiconductor interface. Such an enhancement is consistent with a sequential tunneling process via localized states located in the vicinity of the Al2O3/GaAs interface. For spin-polarized carriers these states act as an accumulation layer where the spin lifetime is large. A model taking into account the spin lifetime and the escape tunneling time for carriers traveling back into the ferromagnetic contact reproduces accurately the experimental results.
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pubmed:language |
eng
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pubmed:journal | |
pubmed:status |
PubMed-not-MEDLINE
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pubmed:month |
Jan
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pubmed:issn |
0031-9007
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pubmed:author | |
pubmed:issnType |
Print
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pubmed:day |
23
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pubmed:volume |
102
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pubmed:owner |
NLM
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pubmed:authorsComplete |
Y
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pubmed:pagination |
036601
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pubmed:year |
2009
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pubmed:articleTitle |
Enhancement of the spin accumulation at the interface between a spin-polarized tunnel junction and a semiconductor.
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pubmed:affiliation |
Unité Mixte de Physique CNRS-Thales, Route départementale 128, 91767 Palaiseau Cedex and Université Paris-Sud 91405, Orsay, France. michael.tran@thalesgroup.com
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pubmed:publicationType |
Journal Article
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