Linked Life Data

19214304

Source:http://linkedlifedata.com/resource/pubmed/id/19214304

Statements in which the resource exists as a subject.
PredicateObject
rdf:type
lifeskim:mentions
pubmed:issue
8
pubmed:dateCreated
2009-2-13
pubmed:abstractText
The diffraction limit, d approximately lambda/2, constrains the resolution with which structures may be produced using photolithography. Practical limits for d are in the 100 nm range. To circumvent this limit, photolithography can be used to fabricate a sacrificial electrode that is then used to initiate and propagate the growth by electrodeposition of a nanowire. We have described a version of this strategy in which the sacrificial electrode delimits one edge of the nascent nanowire, and a microfabricated "ceiling" constrains its height during growth. The width of the nanowire is determined by the electrochemical deposition parameters (deposition time, applied potential, and solution composition). Using this method, called lithographically patterned nanowire electrodeposition (LPNE), nanowires with minimum dimensions of 11 nm (w) x 5 nm (h) have been obtained. The lengths of these nanowires can be wafer-scale. LPNE has been used to synthesize nanowires composed of bismuth, gold, silver, palladium, platinum, and lead telluride.
pubmed:language
eng
pubmed:journal
pubmed:status
PubMed-not-MEDLINE
pubmed:month
Feb
pubmed:issn
1359-7345
pubmed:author
pubmed:issnType
Print
pubmed:day
28
pubmed:owner
NLM
pubmed:authorsComplete
Y
pubmed:pagination
859-73
pubmed:year
2009
pubmed:articleTitle
Cheating the diffraction limit: electrodeposited nanowires patterned by photolithography.
pubmed:affiliation
Department of Chemistry, University of California, Irvine, CA 92697-2025, USA.
pubmed:publicationType
Journal Article