|
rdf:type |
|
|
lifeskim:mentions |
|
|
pubmed:issue |
7
|
|
pubmed:dateCreated |
2006-10-9
|
|
pubmed:abstractText |
Textured alumina films have been used to fabricate nanoscale pores in Si3N4 membranes. A few nanometer-thick alumina layer was used as a masking material for nanopore fabrication, and the pattern was transferred into a 100-nm thick, 200 microm x 200 microm Si3N4 membrane by reactive ion etching (RIE). The nanopores were found to be concentrated in a approximately 150-microm diameter region at the center of the membrane.
|
|
pubmed:language |
eng
|
|
pubmed:journal |
|
|
pubmed:citationSubset |
IM
|
|
pubmed:chemical |
|
|
pubmed:status |
MEDLINE
|
|
pubmed:month |
Jul
|
|
pubmed:issn |
1533-4880
|
|
pubmed:author |
|
|
pubmed:issnType |
Print
|
|
pubmed:volume |
6
|
|
pubmed:owner |
NLM
|
|
pubmed:authorsComplete |
Y
|
|
pubmed:pagination |
2175-81
|
|
pubmed:meshHeading |
pubmed-meshheading:17025145-Crystallization,
pubmed-meshheading:17025145-Macromolecular Substances,
pubmed-meshheading:17025145-Materials Testing,
pubmed-meshheading:17025145-Membranes, Artificial,
pubmed-meshheading:17025145-Molecular Conformation,
pubmed-meshheading:17025145-Nanostructures,
pubmed-meshheading:17025145-Nanotechnology,
pubmed-meshheading:17025145-Particle Size,
pubmed-meshheading:17025145-Porosity,
pubmed-meshheading:17025145-Silicon Compounds,
pubmed-meshheading:17025145-Surface Properties,
pubmed-meshheading:17025145-Ultrafiltration
|
|
pubmed:year |
2006
|
|
pubmed:articleTitle |
Fabrication of nanopores in a 100-nm thick Si3N4 membrane.
|
|
pubmed:affiliation |
Department of Mechanical Engineering, Northwestern University, Evanston, IL 60208, USA.
|
|
pubmed:publicationType |
Journal Article,
Research Support, U.S. Gov't, Non-P.H.S.,
Research Support, Non-U.S. Gov't
|
