Linked Life Data

14960089

Source:http://linkedlifedata.com/resource/pubmed/id/14960089

Statements in which the resource exists as a subject.
PredicateObject
rdf:type
lifeskim:mentions
pubmed:issue
4
pubmed:dateCreated
2004-2-12
pubmed:abstractText
Producing channel waveguides requires a photolithographic mask, but the standard technique of using thermally evaporated metal films for proton exchange has proved to be unsuitable for withstanding the rather aggressive process of reverse proton exchange. We report the fabrication of a nonstoichiometric silica mask by ion-plating plasma-assisted deposition. This mask is strong enough to resist both direct and reverse proton exchange and is also compatible with anisotropic dry etching for patterning the mask and with electric field poling. Our technique is a practical alternative to the use of SiO2 sputtered masks.
pubmed:language
eng
pubmed:journal
pubmed:status
PubMed-not-MEDLINE
pubmed:month
Feb
pubmed:issn
0003-6935
pubmed:author
pubmed:issnType
Print
pubmed:day
1
pubmed:volume
43
pubmed:owner
NLM
pubmed:authorsComplete
Y
pubmed:pagination
940-3
pubmed:year
2004
pubmed:articleTitle
Nonstoichiometric silica mask for fabricating reverse proton-exchanged waveguides in lithium niobate crystals.
pubmed:affiliation
Centro per la Ricerca Elettronica in Sicilia, Laboratorio Optoelettronica, Via Regione Siciliana 49, 90046 Monreale, PA, Italy.
pubmed:publicationType
Journal Article