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pubmed-article:20067318pubmed:abstractTextThis paper reports on the use of silicon nanowires (SiNWs), easily prepared in a single step by chemical etching of crystalline silicon in HF/AgNO(3) aqueous solution, as a highly sensitive substrate for laser desorption/ionization mass spectrometry (LDI-MS) analysis. The SiNWs' diameter and length depend on the etchant concentration and dissolution time. Optimized LDI substrate consists of nanowires with an average diameter in the range of 20-100 nm and 2.5 mum in length. The optimized SiNWs' surface morphology coupled to a controlled surface chemistry allowed a significant LDI-MS performance through measurements of a broad range of analytes, including small molecules, peptides, and a bovine serum albumin (BSA) digest. A signal-to-noise ratio of 250 was ascertained for a 10 fmol bradykinin pick, in reflector mode acquisition. Likewise, the sutent, a small tyrosine kinase inhibitor, could be observed down to 10 fmol, as compared to 500 fmol limit detection using the classical matrix-assisted laser desorption/ionization mass spectrometry (MALDI-MS). We have further investigated the optical properties of the nanowires, and our results suggest that they have a small or no effect on the desorption/ionization (D/I) process. On the contrary, the surface morphology and thermal properties of the silicon nanostructures are found to be the essential features contributing to the D/I performance.lld:pubmed
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pubmed-article:20067318pubmed:authorpubmed-author:MelnykOlegOlld:pubmed
pubmed-article:20067318pubmed:authorpubmed-author:DrobecqHervéHlld:pubmed
pubmed-article:20067318pubmed:authorpubmed-author:CoffinierYann...lld:pubmed
pubmed-article:20067318pubmed:authorpubmed-author:BoukherroubRa...lld:pubmed
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pubmed-article:20067318pubmed:day19lld:pubmed
pubmed-article:20067318pubmed:volume26lld:pubmed
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pubmed-article:20067318pubmed:pagination1354-61lld:pubmed
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pubmed-article:20067318pubmed:year2010lld:pubmed
pubmed-article:20067318pubmed:articleTitleMatrix-free laser desorption/ionization mass spectrometry on silicon nanowire arrays prepared by chemical etching of crystalline silicon.lld:pubmed
pubmed-article:20067318pubmed:affiliationInstitut de Recherche Interdisciplinaire (CNRS-USR 3078), Parc de la Haute Borne, 50 Avenue de Halley, BP 70478, 59658 Villeneuve d'Ascq, France.lld:pubmed
pubmed-article:20067318pubmed:publicationTypeJournal Articlelld:pubmed
pubmed-article:20067318pubmed:publicationTypeResearch Support, Non-U.S. Gov'tlld:pubmed