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pubmed-article:21170428pubmed:abstractTextOxygen plasma etching of electrospun polymer fibers containing spherical colloids is presented as a new approach towards anisotropic colloidal nanoparticles. The detailed morphology of the resulting nanoparticles can be precisely controlled in a continuous way. The same approach is also amenable to prepare inorganic nanoparticles with double-sided patches.lld:pubmed
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pubmed-article:21170428pubmed:authorpubmed-author:ReayD ADAlld:pubmed
pubmed-article:21170428pubmed:authorpubmed-author:TungChen-HoCHlld:pubmed
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pubmed-article:21170428pubmed:authorpubmed-author:YangGuoqiangGlld:pubmed
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pubmed-article:21170428pubmed:year2011lld:pubmed
pubmed-article:21170428pubmed:articleTitleAnisotropic oxygen plasma etching of colloidal particles in electrospun fibers.lld:pubmed
pubmed-article:21170428pubmed:affiliationBeijing National Laboratory for Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China.lld:pubmed
pubmed-article:21170428pubmed:publicationTypeJournal Articlelld:pubmed
pubmed-article:21170428pubmed:publicationTypeResearch Support, Non-U.S. Gov'tlld:pubmed