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pubmed-article:17026317rdf:typepubmed:Citationlld:pubmed
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pubmed-article:17026317pubmed:issue8lld:pubmed
pubmed-article:17026317pubmed:dateCreated2006-10-9lld:pubmed
pubmed-article:17026317pubmed:abstractTextThe key physical processes governing electron-beam-assisted chemical vapor deposition are analyzed via a combination of theoretical modeling and supporting experiments. The scaling laws that define growth of the nanoscale deposits are developed and verified using carefully designed experiments of carbon deposition from methane onto a silicon substrate. The results suggest that the chamber-scale continuous transport of the precursor gas is the rate controlling process in electron-beam chemical vapor deposition.lld:pubmed
pubmed-article:17026317pubmed:languageenglld:pubmed
pubmed-article:17026317pubmed:journalhttp://linkedlifedata.com/r...lld:pubmed
pubmed-article:17026317pubmed:statusPubMed-not-MEDLINElld:pubmed
pubmed-article:17026317pubmed:monthAuglld:pubmed
pubmed-article:17026317pubmed:issn0031-9007lld:pubmed
pubmed-article:17026317pubmed:authorpubmed-author:WhiteWilliam...lld:pubmed
pubmed-article:17026317pubmed:authorpubmed-author:FedorovAndrei...lld:pubmed
pubmed-article:17026317pubmed:authorpubmed-author:RykaczewskiKo...lld:pubmed
pubmed-article:17026317pubmed:issnTypePrintlld:pubmed
pubmed-article:17026317pubmed:day25lld:pubmed
pubmed-article:17026317pubmed:volume97lld:pubmed
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pubmed-article:17026317pubmed:pagination086101lld:pubmed
pubmed-article:17026317pubmed:year2006lld:pubmed
pubmed-article:17026317pubmed:articleTitleWhat controls deposition rate in electron-beam chemical vapor deposition?lld:pubmed
pubmed-article:17026317pubmed:affiliationWoodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, USA.lld:pubmed
pubmed-article:17026317pubmed:publicationTypeJournal Articlelld:pubmed