Role of interstitial voids in oxides on formation and stabilization of reactive radicals: interstitial HO2 radicals in F2-laser-irradiated amorphous SiO2.

Source:http://linkedlifedata.com/resource/pubmed/id/16620108

J. Am. Chem. Soc. 2006 Apr 26 128 16 5371-4

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PMID
16620108